Material Evaluation

A film thickness measurement system based on the high precision spectrophotometry features compact size and affordable price. Every necessary component is built in one body for stable measurement data. Although offered at affordable price, there is no compromise on accuracy and even optical constant analysis is possible.

This instrument enables extremely precise analysis of film thickness and optical constants by measuring absolute spectral reflectance of microscopic regions.
Non-destructive and non-contact thickness measurement can be carried out on multilayered films and various coating layers including films, wafers, and optical materials.
Measurement speed is as fast as 1 second / point. Software is easy to use even for beginner users analyzing optical constants.
 

This in-line monitor can measure film thicknesses across the full-width and full-length of film products during manufacturing.
By combining our unique spectral interference technology with our newly developed high-precision film thickness processing technology, a single monitor can measure film thicknesses as wide as 500 mm in the shortest interval of 0.01 seconds

This off-line monitor easily inspects film thickness unevenness ‘mura’ of the entire area of film for use in R&D and sampling inspection of production lines.
Entire area of film can be measured at high speed and with great precision.

High quality control of Optical axis! 3σ≦0.02°
for low retardation measurement

RETS-100nx is a retardation measuring system for all kinds of films such as OLED polarizing plate, laminated retardation film and polarizing plate with retardation film for IPS liquid crystal.
Extremely high retardation as 60,000 nm can be measured with high speed and high precision.
Lamination state of film can be measured "non-destructive without peeling".
Furthermore, on the operation, simple software and a correction function that copes with misalignment due to sample re-placement are installed. High-precision measurement can be easy to use.

MINUK is capable of evaluating transparent foreign substances and defects in the nano-order, obtaining height direction information in a single shot, and making non-destructive, non-contact and non-invasive measurements.
MINUK also allows the rough position around the target to be scanned at high speed, without focusing, to find the required location.

High accurate and instant absolute quantum efficiency measurement is possible for powder, solution and solid sample. Stray light effect in UV wavelength region is substantially eliminated. Further, high sensitivity is achieved thanks to integrating hemisphere as detector, and re-excitation elimination function enables to obtain “True property” of phosphor characteristics.

Detecting singlet oxygen (Reactive Oxygen Species（ROS))

This instrument enables extremely precise analysis of film thickness and optical constants by measuring absolute spectral reflectance of microscopic regions.
Non-destructive and non-contact thickness measurement can be carried out on multilayered films and various coating layers including films, wafers, and optical materials.
Measurement speed is as fast as 1 second / point. Software is easy to use even for beginner users analyzing optical constants.
 

This in-line monitor can measure film thicknesses across the full-width and full-length of film products during manufacturing.
By combining our unique spectral interference technology with our newly developed high-precision film thickness processing technology, a single monitor can measure film thicknesses as wide as 500 mm in the shortest interval of 0.01 seconds

This off-line monitor easily inspects film thickness unevenness ‘mura’ of the entire area of film for use in R&D and sampling inspection of production lines.
Entire area of film can be measured at high speed and with great precision.