Built-in film thickness monitor FE-3
Accurate multi-layer film thickness measurement which has characteristics of wavelength dependency
Are you interested in alliance or distributorship for this product? |
|
- Product
- Specification
- Configuration
- Measured Data
Product
- A film thickness measurement system based on the high precision spectral interferometry
- Fast Fourier Transformation (FFT) Method as an analytical algorithm (Patent No: 4834847)
- Variety of measurement optics using optical fiber
- Integratable for a wide variety of manufacturing equipments
- Real time thickness measurement
- Remote control and multi point measurement
- White LED light source - long life and high stability
- Film thickness analysis for multi-layer film
- Optic film (Hard Coat, AR film, ITO …etc)
- FPD (resist, SOI, SiO2…etc)
Specification
Type | FE-3/40C | FE-3/200I |
Principle | spectral interferometry | |
Thickness range(nd) | 20 nm ~ 40 μm | 3 μm ~ 200 μm |
Wavelength range | 430 nm ~ 650 nm | 900 nm ~ 1600 nm |
Accuracy | ± 0.2 nm* | - |
Repeatability | 2.1σ < 0.1nm | - |
Measurement Time | 0.1 s ~ 10 s | |
Spot diameter | Approx. φ 1.2 mm | |
Light source | White LED | Halogen |
Optical fiber | Type Y optical fiber 1.5 m ~ 100 m | |
Size and Weight | W300 x D300 x H150mm, Approx.10 kg | |
Software | Peak-valley method, FFT analysis, Optimization |
* To guaranteed value of VLSI thickness standard(100nm SiO2/Si)
Configuration
- In-plane distribution measurement for SC wafer
- In-plane distribution measurement for glass substrate
- Real-time measurement
- Quality control in flow direction
- Useable for vacuum chamber
- Real-time measurement
- Quality control in cross direction
- Product
- Specification
- Configuration
- Measured Data
Related Information
Related Product
Thickness Monitor FE-3000 | |
Thickness Monitor FE-300 | |
Array Spectrometer MCPD-9800 | |
Spectrum Ellipsometer FE-5000/5000S | |
Si Wafer Thickness Monitoring System SF-3 |